Layout decomposition for hybrid E-beam and DSA double patterning lithography
Published in In the proceedings of 2017 IEEE International Symposium on Circuits and Systems (ISCAS), 2017
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Recommended citation: Yunfeng Yang, Fan Yang, Wai-Shing Luk, Changhao Yan, Xuan Zeng, Xiangdong Hu, "Layout decomposition for hybrid E-beam and DSA double patterning lithography." In the proceedings of 2017 IEEE International Symposium on Circuits and Systems (ISCAS), 2017.