Efficient ILT via multi-level lithography simulation
Published in In the proceedings of 2023 60th ACM/IEEE Design Automation Conference (DAC), 2023
Use Google Scholar for full citation
Recommended citation: Shuyuan Sun, Fan Yang, Bei Yu, Li Shang, Xuan Zeng, "Efficient ILT via multi-level lithography simulation." In the proceedings of 2023 60th ACM/IEEE Design Automation Conference (DAC), 2023.