Adaptive ILT via Multi-Level Lithography Simulation
Published in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 2025
Use Google Scholar for full citation
Recommended citation: Shuyuan Sun, Fan Yang, Bei Yu, Li Shang, Xuan Zeng, "Adaptive ILT via Multi-Level Lithography Simulation." IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 2025.